Reliability of strained-channel NMOSFETs with SiN capping layer on Hi-wafers with a thin LPCVD-TEOS buffer layer

Date

Authors

Chen, King-Sheng

Lin, Horng-Chih

Cha, Tien-Sheng

Huang, Tiao-Yuan

URI

https://ir.lib.nycu.edu.tw/handle/11536/135143

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會議論文;;Conferences Paper