標題: Reliability of strained-channel NMOSFETs with SiN capping layer on Hi-wafers with a thin LPCVD-TEOS buffer layer
作者: Tsai, Tzu-, I
Lee, Yao-Jen
Chen, King-Sheng
Wang, Jeff
Wan, Chia-Chen
Hsueh, Fu-Kuo
Lin, Horng-Chih
Cha, Tien-Sheng
Huang, Tiao-Yuan
物理研究所
電子工程學系及電子研究所
Institute of Physics
Department of Electronics Engineering and Institute of Electronics
公開日期: 2007
URI: http://hdl.handle.net/11536/135143
ISBN: 978-1-4244-1891-6
期刊: 2007 INTERNATIONAL SEMICONDUCTOR DEVICE RESEARCH SYMPOSIUM, VOLS 1 AND 2
起始頁: 331
結束頁: +
顯示於類別:會議論文