Reliability of strained-channel NMOSFETs with SiN capping layer on Hi-wafers with a thin LPCVD-TEOS buffer layer

標題:	Reliability of strained-channel NMOSFETs with SiN capping layer on Hi-wafers with a thin LPCVD-TEOS buffer layer
作者:	Tsai, Tzu-, I Lee, Yao-Jen Chen, King-Sheng Wang, Jeff Wan, Chia-Chen Hsueh, Fu-Kuo Lin, Horng-Chih Cha, Tien-Sheng Huang, Tiao-Yuan 物理研究所電子工程學系及電子研究所 Institute of Physics Department of Electronics Engineering and Institute of Electronics
公開日期:	2007
URI:	http://hdl.handle.net/11536/135143
ISBN:	978-1-4244-1891-6
期刊:	2007 INTERNATIONAL SEMICONDUCTOR DEVICE RESEARCH SYMPOSIUM, VOLS 1 AND 2
起始頁:	331
結束頁:	+
顯示於類別：	會議論文