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積體電路化學品與材料之開發---子計畫I:超微細Al/sub 2/O/sub 3/及Y-PSZ粉末之合成及其化學機械研磨劑之製備(II)
積體電路化學品與材料之開發---子計畫I:超微細Al/sub 2/O/sub 3/及Y-PSZ粉末之合成及其化學機械研磨劑之製備(II)
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88CPCE009009.pdf
(16.38 MB)
Date
1999
Authors
涂肇嘉
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Abstract
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Keywords
超微粒
,
氧化鋁
,
化學機械拋光
,
Ultrafine particle
,
Alumina
,
Chemical mechanical polishing
Citation
URI
https://www.grb.gov.tw/search/planDetail?id=461621&docId=84633
https://ir.lib.nycu.edu.tw/handle/11536/94190
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