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積體電路化學品與材料之開發---子計畫I:超微細Al/sub 2/O/sub 3/及Y-PSZ粉末之合成及其化學機械研磨劑之製備(II)

dc.contributor.author涂肇嘉en_US
dc.contributor.department交通大學材料科學與工程研究所zh_TW
dc.date.accessioned2014-12-13T10:36:49Z
dc.date.available2014-12-13T10:36:49Z
dc.date.issued1999en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC88-CPC-E009-009zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=461621&docId=84633en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/94190
dc.language.isozh_TWen_US
dc.subject超微粒zh_TW
dc.subject氧化鋁zh_TW
dc.subject化學機械拋光zh_TW
dc.subjectUltrafine particleen_US
dc.subjectAluminaen_US
dc.subjectChemical mechanical polishingen_US
dc.title積體電路化學品與材料之開發---子計畫I:超微細Al/sub 2/O/sub 3/及Y-PSZ粉末之合成及其化學機械研磨劑之製備(II)zh_TW
dc.titleThe Syntheses of Ultrafine Al/sub 2/O/sub 3/ and Y-PSZ Powders and the Preparation of Related Chemical Mechanical Polishing Slurries (II)en_US
dc.typePlanen_US

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