Improvement in instable analysis of heat inflation induced line-width after replacing pellicle with diamond film on reticle (photo-masks)
| dc.citation.epage | 301 | en_US |
| dc.citation.issue | 3-4 | en_US |
| dc.citation.spage | 297 | en_US |
| dc.citation.volume | 77 | en_US |
| dc.citation.woscount | 1 | |
| dc.contributor.author | Kuo, YK | en_US |
| dc.contributor.author | Chao, CG | en_US |
| dc.contributor.department | 材料科學與工程學系 | zh_TW |
| dc.contributor.department | Department of Materials Science and Engineering | en_US |
| dc.date.accessioned | 2014-12-08T15:19:29Z | |
| dc.date.available | 2014-12-08T15:19:29Z | |
| dc.date.issued | 2005-04-01 | en_US |
| dc.description.abstract | A new reticle is designed that takes advantage of the high value of thermal conductivity of diamond to add a layer of diamond film to the bottom of traditional pellicle-reticle; that is, the new reticle replaces the pellicle with a diamond material. This method may help maintain the future manufacturing process of photo-lithography below 35 nm and can improve the problem of slightly out of shape reticle caused by the long-term effects of light and thermal energy. (c) 2004 Elsevier B.V. All rights reserved. | en_US |
| dc.identifier.doi | 10.1016/j.mee.2004.11.013 | en_US |
| dc.identifier.issn | 0167-9317 | en_US |
| dc.identifier.journal | MICROELECTRONIC ENGINEERING | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1016/j.mee.2004.11.013 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/13880 | |
| dc.identifier.wosnumber | WOS:000228797200015 | |
| dc.language.iso | en_US | en_US |
| dc.title | Improvement in instable analysis of heat inflation induced line-width after replacing pellicle with diamond film on reticle (photo-masks) | en_US |
| dc.type | Article | en_US |