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Photoluminescence studies of In-doped GaN : Mg films

dc.citation.epage7506en_US
dc.citation.issue10en_US
dc.citation.spage7504en_US
dc.citation.volume44en_US
dc.citation.woscount2
dc.contributor.authorChang, FCen_US
dc.contributor.authorChou, WCen_US
dc.contributor.authorChen, WHen_US
dc.contributor.authorLee, MCen_US
dc.contributor.authorChen, WKen_US
dc.contributor.authorHuang, HYen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.date.accessioned2014-12-08T15:18:16Z
dc.date.available2014-12-08T15:18:16Z
dc.date.issued2005-10-01en_US
dc.description.abstractPhotoluminescence (PL) studies of In-doped GaN:Mg films revealed that the Mg-related emission at 3.1 eV is enhanced by more than one order of magnitude on the shoulder of the broad band centered at 2.8eV for GaN:Mg after an optimal In concentration was added into the films. This enhancement of the 3.1 eV band is believed to be associated with the reduction in the number of self-compensation centers. A slow decay in PL intensity evolution was also observed, which may be ascribed to a local energy barrier that impedes carriers that relax into the valence band. The temperature dependences of the decay time constants were measured and a barrier energy as high as similar to 103 +/- 7 meV was obtained for In-doped GaN:Mg as compared with 69 8 meV for GaN:Mg.en_US
dc.identifier.doi10.1143/JJAP.44.7504en_US
dc.identifier.issn0021-4922en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERSen_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.44.7504en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/13197
dc.identifier.wosnumberWOS:000232739300063
dc.language.isoen_USen_US
dc.subjectGaN : Mgen_US
dc.subjectluminescenceen_US
dc.subjectisoelectronic dopingen_US
dc.subjectdecay timeen_US
dc.subjectself-compensationen_US
dc.titlePhotoluminescence studies of In-doped GaN : Mg filmsen_US
dc.typeArticleen_US

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