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Improving Crystalline Silicon Solar Cell Efficiency Using Graded-Refractive-Index SiON/ZnO Nanostructures

dc.citation.epage0en_US
dc.citation.spage0en_US
dc.citation.woscount0en_US
dc.contributor.authorTu, Yung-Chunen_US
dc.contributor.authorWang, Shui-Jinnen_US
dc.contributor.authorWu, Chien-Hungen_US
dc.contributor.authorChang, Kow-Mingen_US
dc.contributor.authorLin, Tseng-Hsingen_US
dc.contributor.authorHung, Chien-Hsiungen_US
dc.contributor.authorWu, Jhen-Siangen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2019-04-03T06:38:41Z
dc.date.available2019-04-03T06:38:41Z
dc.date.issued2015-01-01en_US
dc.description.abstractThe fabrication of silicon oxynitride (SiON)/ZnO nanotube (NT) arrays and their application in improving the energy conversion efficiency (eta) of crystalline Si-based solar cells (SCs) are reported. The SiON/ZnO NT arrays have a graded-refractive-index that varies from 3.5 (Si) to 1.9 similar to 2.0 (Si3N4 and ZnO) to 1.72 similar to 1.75 (SiON) to 1 (air). Experimental results show that the use of 0.4 mu m long ZnO NT arrays coated with a 150 nm thick SiON film increases Delta eta/eta by 39.2% under AM 1.5 G (100mW/cm(2)) illumination as compared to that of regular SCs with a Si3N4/micropyramid surface. This enhancement can be attributed to SiON/ZnO NT arrays effectively releasing surface reflection and minimizing Fresnel loss.en_US
dc.identifier.doi10.1155/2015/275697en_US
dc.identifier.issn1110-662Xen_US
dc.identifier.journalINTERNATIONAL JOURNAL OF PHOTOENERGYen_US
dc.identifier.urihttp://dx.doi.org/10.1155/2015/275697en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/127950
dc.identifier.wosnumberWOS:000357172700001en_US
dc.language.isoen_USen_US
dc.titleImproving Crystalline Silicon Solar Cell Efficiency Using Graded-Refractive-Index SiON/ZnO Nanostructuresen_US
dc.typeArticleen_US

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