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Thickness effect on ultrafast thermalization of carriers in above-band-gap states in ZnO epitaxial films

dc.citation.epageen_US
dc.citation.issue49en_US
dc.citation.volume43en_US
dc.citation.woscount6
dc.contributor.authorOu, Po-Chien_US
dc.contributor.authorLin, Ja-Honen_US
dc.contributor.authorChang, Chi-Anen_US
dc.contributor.authorLiu, Wei-Reinen_US
dc.contributor.authorHsieh, Wen-Fengen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:38:17Z
dc.date.available2014-12-08T15:38:17Z
dc.date.issued2010-12-15en_US
dc.description.abstractEnergy-dependent free-carrier dynamics was investigated in 70 nm (thin) and 1 mu m (thick) ZnO epifilms using the optical pump-probe technique. The far-above-band-gap dynamics in the thin epifilm reveals the prolonged relaxation and the slow recovery of renormalized band gap. The band-gap renormalization (BGR) effect is affected by the inefficient carrier-phonon scattering. In addition, the loss of excited carrier density via surface trapping results in an energy-dependent BGR buildup time. However, the far-above-band-gap dynamics in the thick epifilm reveals fast relaxation followed by BGR recovery, which is independent of the photon energy. The near-band-gap dynamics shows an ultrafast carrier thermalization both in the thin and the thick epifilms.en_US
dc.identifier.doi10.1088/0022-3727/43/49/495103en_US
dc.identifier.issn0022-3727en_US
dc.identifier.journalJOURNAL OF PHYSICS D-APPLIED PHYSICSen_US
dc.identifier.urihttp://dx.doi.org/10.1088/0022-3727/43/49/495103en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/26224
dc.identifier.wosnumberWOS:000284606800007
dc.language.isoen_USen_US
dc.titleThickness effect on ultrafast thermalization of carriers in above-band-gap states in ZnO epitaxial filmsen_US
dc.typeArticleen_US

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