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Transient Device Simulation of Floating Gate Nonvolatile Memory Cell With a Local Trap

dc.citation.epage1882en_US
dc.citation.issue8en_US
dc.citation.spage1873en_US
dc.citation.volume57en_US
dc.citation.woscount3
dc.contributor.authorWatanabe, Hiroshien_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:48:37Z
dc.date.available2014-12-08T15:48:37Z
dc.date.issued2010-08-01en_US
dc.description.abstractThe single-electron general-purpose device simulator is improved to carry out a wide-range transient analysis from 1 ps to 10 years. We apply this simulator to a floating gate (FG) nonvolatile memory cell in order to simulate a degradation mode of data retention owing to the direct tunneling enhanced by the fixed charge stored by a local trap in an interpoly dielectric. The scaling impact of ideal high-K interpoly dielectric FG nonvolatile memory cell is also investigated.en_US
dc.identifier.doi10.1109/TED.2010.2051248en_US
dc.identifier.issn0018-9383en_US
dc.identifier.journalIEEE TRANSACTIONS ON ELECTRON DEVICESen_US
dc.identifier.urihttp://dx.doi.org/10.1109/TED.2010.2051248en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/32336
dc.identifier.wosnumberWOS:000283382800018
dc.language.isoen_USen_US
dc.subjectCoulomb oscillationen_US
dc.subjectdevice modelingen_US
dc.subjectdevice simulationen_US
dc.subjectfloating gate (FG)en_US
dc.subjectlocal trapen_US
dc.subjectmemoryen_US
dc.subjectmodelingen_US
dc.subjectsingle-electron sensitivityen_US
dc.subjectTCADen_US
dc.subjecttrap-assisted tunnelingen_US
dc.titleTransient Device Simulation of Floating Gate Nonvolatile Memory Cell With a Local Trapen_US
dc.typeArticleen_US

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