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GaN Thickness Effect on Directional Light Enhancement from GaN-Based Film-Transferred Photonic Crystal Light-Emitting Diodes

dc.citation.issue4en_US
dc.citation.volume49en_US
dc.citation.woscount3
dc.contributor.authorLai, Chun-Fengen_US
dc.contributor.authorChao, Chia-Hsinen_US
dc.contributor.authorKuo, Hao-Chungen_US
dc.contributor.authorYu, Peichenen_US
dc.contributor.authorYen, His-Hsuanen_US
dc.contributor.authorYeh, Wen-Yungen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:07:41Z
dc.date.available2014-12-08T15:07:41Z
dc.date.issued2010en_US
dc.description.abstractDirectional light enhancement behavior including collimated far-field patterns sensitively depending on both photonic crystal (PhC) lattice constant and GaN thickness from GaN film-transferred light-emitting diodes (FTLEDs) with a triangular PhC lattice has been experimentally studied. Far-field pattern measurement in the Gamma-M and Gamma-K directions of GaN PhC FTLEDs with various lattice constants and GaN thicknesses revealed different far-field profiles as detemined on the basis of guided mode extraction of Bragg's diffraction. Additionally, three-dimensional (3D) far-field measurement revealing the PhC diffraction patterns was also demonstrated. We also used the 3D finite-different time-domain method to confirm the experimental results. (C) 2010 The Japan Society of Applied Physicsen_US
dc.identifier.doi10.1143/JJAP.49.04DG09en_US
dc.identifier.issn0021-4922en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICSen_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.49.04DG09en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/6040
dc.identifier.wosnumberWOS:000277301300132
dc.language.isoen_USen_US
dc.titleGaN Thickness Effect on Directional Light Enhancement from GaN-Based Film-Transferred Photonic Crystal Light-Emitting Diodesen_US
dc.typeArticleen_US

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