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Chemical bath deposition of IrO2 films on ITO substrate

dc.citation.epage14990en_US
dc.citation.issue9en_US
dc.citation.spage14983en_US
dc.citation.volume40en_US
dc.citation.woscount0
dc.contributor.authorChen, Jing-Yuen_US
dc.contributor.authorChen, Yong-Minen_US
dc.contributor.authorSun, Yuen_US
dc.contributor.authorLee, Jyh-Fuen_US
dc.contributor.authorChen, San-Yuanen_US
dc.contributor.authorChen, Po-Chunen_US
dc.contributor.authorWu, Pu-Weien_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.date.accessioned2014-12-08T15:36:46Z
dc.date.available2014-12-08T15:36:46Z
dc.date.issued2014-11-01en_US
dc.description.abstractA chemical bath is shown to deposit an IrO2 film on an ITO substrate. The chemical bath is prepared by mixing an Ir precursor (Na3IrCl6 center dot xH(2)O), an oxidizer (NaClO), a complexing agent (NaNO2), and a complex agent/stabilizer (NaOH) in an aqueous solution at a molar ratio of 1:1.5:10:30. From the UV-vis absorption spectra, complexes such as [Ir(OH)(6)]m(3-), [Ir(NO2)(4)Cl-2](3-), and [Ir(NO2)(3)Cl-3](3-) are identified. These complexes are relatively stable, minimizing the undesirable homogeneous precipitation of IrO2 nanoparticles in favor of the heterogeneous growth of the IrO2 film on the ITO substrate. Diffraction patterns from the as-deposited IrO2 film reveal an amorphous structure. In addition, profiles from X-ray absorption spectroscopy and X-ray photoelectron spectroscopy indicate that the oxidation state of the Ir in the as-deposited IrO2 film is +4. Thermogravimetric analysis confirms the inclusion of 10 wt% hydrated water in the as-deposited IrO2 film. Scanning electron microscope images reveal a continuous solid film with a smooth surface. The amorphous IrO2 film becomes rutile IrO2 phase after a mild heat treatment in air. (c) 2014 Elsevier Ltd and Techna Group S.r.l. All rights reserved.en_US
dc.identifier.doi10.1016/j.ceramint.2014.06.098en_US
dc.identifier.issn0272-8842en_US
dc.identifier.journalCERAMICS INTERNATIONALen_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.ceramint.2014.06.098en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/25151
dc.identifier.wosnumberWOS:000341343300055
dc.language.isoen_USen_US
dc.subjectIridium oxideen_US
dc.subjectThin filmen_US
dc.subjectChemical bath depositionen_US
dc.subjectIndium tin oxideen_US
dc.titleChemical bath deposition of IrO2 films on ITO substrateen_US
dc.typeArticleen_US

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