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Deposition of indium tin oxide films on polycarbonate substrates by radio-frequency magnetron sputtering

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dc.citation.epage227en_US
dc.citation.spage221en_US
dc.citation.volume298en_US
dc.citation.woscount80en_US
dc.contributor.authorWu, WFen_US
dc.contributor.authorChiou, BSen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2019-04-02T05:59:55Z
dc.date.available2019-04-02T05:59:55Z
dc.date.issued1997-04-20en_US
dc.description.abstractIndium tin oxide (ITO) films have been deposited onto polycarbonate (PC) substrates by radio frequency (rf) magnetron sputtering. The influence of the oxygen content during sputtering on the film morphology, and the electrical and optical properties of the films have been investigated. Both the refractive index and the extinction coefficient decrease with increasing oxygen content. In this study, the figures of merit T-10/R-sh of the films are higher than those for low-temperature sputtered films reported in the literature. (C) 1997 Elsevier Science S.A.en_US
dc.identifier.doi10.1016/S0040-6090(96)09311-Xen_US
dc.identifier.issn0040-6090en_US
dc.identifier.journalTHIN SOLID FILMSen_US
dc.identifier.urihttp://dx.doi.org/10.1016/S0040-6090(96)09311-Xen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/149563
dc.identifier.wosnumberWOS:A1997XH32400038en_US
dc.language.isoen_USen_US
dc.subjectcoatingsen_US
dc.subjectindium oxideen_US
dc.subjectoptical propertiesen_US
dc.subjectsputteringen_US
dc.titleDeposition of indium tin oxide films on polycarbonate substrates by radio-frequency magnetron sputteringen_US
dc.typeArticleen_US

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