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新穎反向式微影技術應用於CMOS 32奈米節點及其以下之光學鄰近修正術(OPC)與可製造性設計(DFM)
新穎反向式微影技術應用於CMOS 32奈米節點及其以下之光學鄰近修正術(OPC)與可製造性設計(DFM)
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Date
2010
Authors
余沛慈
Yu Peichen
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https://www.grb.gov.tw/search/planDetail?id=2006720&docId=328118
https://ir.lib.nycu.edu.tw/handle/11536/100341
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