矽晶圓高效減廢超洗淨技術研究

dc.contributor.author	潘扶民	en_US
dc.contributor.author	PAN FU-MING	en_US
dc.contributor.department	國立交通大學毫微米實驗室	zh_TW
dc.date.accessioned	2014-12-13T10:36:56Z
dc.date.available	2014-12-13T10:36:56Z
dc.date.issued	1999	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.identifier.govdoc	NSC88-2215-E317-002	zh_TW
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=418270&docId=74205	en_US
dc.identifier.uri	https://ir.lib.nycu.edu.tw/handle/11536/94279
dc.language.iso	zh_TW	en_US
dc.subject	矽晶圓	zh_TW
dc.subject	超洗淨	zh_TW
dc.subject	表面分析	zh_TW
dc.subject	金氧半導體	zh_TW
dc.subject	金屬汙染物	zh_TW
dc.subject	氮化氧化層	zh_TW
dc.subject	Silicon wafer	en_US
dc.subject	Ultra-cleaning	en_US
dc.subject	Surface analysis	en_US
dc.subject	MOS	en_US
dc.subject	Metal contaminant	en_US
dc.subject	Nitrided oxide	en_US
dc.title	矽晶圓高效減廢超洗淨技術研究	zh_TW
dc.title	Ultra-clean for Silicon Wafers with Less Consumption of Water and Chemicals	en_US
dc.type	Plan	en_US

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