LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TIN AND ZRN THIN-FILMS FROM TI(NET2)4 AND ZR(NET2)4
| dc.citation.epage | INOR | en_US |
| dc.citation.issue | en_US | |
| dc.citation.spage | 253 | en_US |
| dc.citation.volume | 200 | en_US |
| dc.citation.woscount | 0 | |
| dc.contributor.author | CHIU, HT | en_US |
| dc.contributor.author | HUANG, CC | en_US |
| dc.contributor.department | 應用化學系 | zh_TW |
| dc.contributor.department | Department of Applied Chemistry | en_US |
| dc.date.accessioned | 2014-12-08T15:05:31Z | |
| dc.date.available | 2014-12-08T15:05:31Z | |
| dc.date.issued | 1990-08-26 | en_US |
| dc.identifier.issn | 0065-7727 | en_US |
| dc.identifier.journal | ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/4035 | |
| dc.identifier.wosnumber | WOS:A1990DU04202144 | |
| dc.language.iso | en_US | en_US |
| dc.title | LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TIN AND ZRN THIN-FILMS FROM TI(NET2)4 AND ZR(NET2)4 | en_US |
| dc.type | Meeting Abstract | en_US |
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