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Voltage-induced Interface Reconstruction and Electrical Instability of the Ferromagnet-Semiconductor Device

dc.citation.epage0en_US
dc.citation.spage0en_US
dc.citation.volume7en_US
dc.citation.woscount1en_US
dc.contributor.authorChang, Shu-Juien_US
dc.contributor.authorChang, Po-Chunen_US
dc.contributor.authorLin, Wen-Chinen_US
dc.contributor.authorLo, Shao-Huaen_US
dc.contributor.authorChang, Liang-Chunen_US
dc.contributor.authorLee, Shang-Fanen_US
dc.contributor.authorTseng, Yuan-Chiehen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.date.accessioned2019-04-03T06:35:39Z
dc.date.available2019-04-03T06:35:39Z
dc.date.issued2017-03-23en_US
dc.description.abstractUsing x-ray magnetic spectroscopy with in-situ electrical characterizations, we investigated the effects of external voltage on the spin-electronic and transport properties at the interface of a Fe/ZnO device. Layer-, element-, and spin-resolved information of the device was obtained by cross-tuning of the x-ray mode and photon energy, when voltage was applied. At the early stage of the operation, the device exhibited a low-resistance state featuring robust Fe-O bonds. However, the Fe-O bonds were broken with increasing voltage. Breaking of the Fe-O bonds caused the formation of oxygen vacancies and resulted in a high-resistance state. Such interface reconstruction was coupled to a charge-transfer effect via Fe-O hybridization, which suppressed/enhanced the magnetization/coercivity of Fe electronically. Nevertheless, the interface became stabilized with the metallic phase if the device was continuously polarized. During this stage, the spin-polarization of Fe was enhanced whereas the coercivity was lowered by voltage, but changes of both characteristics were reversible. This stage is desirable for spintronic device applications, owing to a different voltage-induced electronic transition compared to the first stage. The study enabled a straightforward detection of the spin-electronic state at the ferromagnet-semiconductor interface in relation to the transport and reversal properties during operation process of the device.en_US
dc.identifier.doi10.1038/s41598-017-00547-4en_US
dc.identifier.issn2045-2322en_US
dc.identifier.journalSCIENTIFIC REPORTSen_US
dc.identifier.urihttp://dx.doi.org/10.1038/s41598-017-00547-4en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/144786
dc.identifier.wosnumberWOS:000397096700005en_US
dc.language.isoen_USen_US
dc.titleVoltage-induced Interface Reconstruction and Electrical Instability of the Ferromagnet-Semiconductor Deviceen_US
dc.typeArticleen_US

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