利用同步輻射光源對三五族氮化物半導體薄膜之特性研究
| dc.contributor.author | 陳文雄 | en_US |
| dc.contributor.department | 交通大學電子物理系 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:37:06Z | |
| dc.date.available | 2014-12-13T10:37:06Z | |
| dc.date.issued | 1999 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC88-2112-M009-031 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=426407&docId=76151 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/94381 | |
| dc.language.iso | zh_TW | en_US |
| dc.subject | 三五族氮化合物 | zh_TW |
| dc.subject | 同步輻射光源 | zh_TW |
| dc.subject | X射線吸收的精細結構光譜 | zh_TW |
| dc.subject | X射線駐波 | zh_TW |
| dc.subject | III-V nitride | en_US |
| dc.subject | Synchrotron radiation | en_US |
| dc.subject | X-ray absorption fine structure (XAFS) | en_US |
| dc.subject | X-ray standing wave (XSW) | en_US |
| dc.title | 利用同步輻射光源對三五族氮化物半導體薄膜之特性研究 | zh_TW |
| dc.title | Synchrotron Radiation Characterization of III-V Nitride Semiconductor Films | en_US |
| dc.type | Plan | en_US |