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Abnormal sub-threshold swing degradation under dynamic hot carrier stress in HfO2/TiN n-channel metal-oxide-semiconductor field-effect-transistors

dc.citation.epageen_US
dc.citation.issue2en_US
dc.citation.volume103en_US
dc.citation.woscount3
dc.contributor.authorTsai, Jyun-Yuen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorLo, Wen-Hungen_US
dc.contributor.authorChen, Ching-Enen_US
dc.contributor.authorHo, Szu-Hanen_US
dc.contributor.authorChen, Hua-Maoen_US
dc.contributor.authorTai, Ya-Hsiangen_US
dc.contributor.authorCheng, Osberten_US
dc.contributor.authorHuang, Cheng-Tungen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:31:11Z
dc.date.available2014-12-08T15:31:11Z
dc.date.issued2013-07-08en_US
dc.description.abstractThis work finds abnormal sub-threshold swing (S.S.) degradation under dynamic hot carrier stress (HCS) in n-channel metal-oxide-semiconductor field-effect-transistors with high-k gate dielectric. Results indicate that there is no change in S.S. after dynamic HCS due to band-to-band hot hole injection at the drain side which acts to diminish the stress field. Moreover, the impaired stress field causes the interface states to mainly distribute in shallow states. This results in ON state current and transconductance decreases, whereas S.S. degradation is insignificant after dynamic HCS. The proposed model is confirmed by one-side charge pumping measurement and gate-to-drain capacitance at varying frequencies. (C) 2013 AIP Publishing LLC.en_US
dc.identifier.doi10.1063/1.4811784en_US
dc.identifier.issn0003-6951en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.4811784en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/22203
dc.identifier.wosnumberWOS:000321761000038
dc.language.isoen_USen_US
dc.titleAbnormal sub-threshold swing degradation under dynamic hot carrier stress in HfO2/TiN n-channel metal-oxide-semiconductor field-effect-transistorsen_US
dc.typeArticleen_US

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