超低介電碳氮化矽薄膜之研究
| dc.contributor.author | 呂志鵬 | zh_TW |
| dc.contributor.author | Leu Jihperng | en_US |
| dc.contributor.department | 國立交通大學材料科學與工程學系（所） | zh_TW |
| dc.date.accessioned | 2016-03-28T08:17:52Z | |
| dc.date.available | 2016-03-28T08:17:52Z | |
| dc.date.issued | 2015 | en_US |
| dc.description.sponsorship | 科技部 | zh_TW |
| dc.identifier.govdoc | MOST103-2221-E009-181-MY3 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=11265363&docId=453651 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/130507 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | 超低介電碳氮化矽薄膜之研究 | zh_TW |
| dc.title | Fabrication and Development of Ultra-Low-K Silcion Carbonitride Films | en_US |
| dc.type | Plan | en_US |
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