<link rel="stylesheet" href="styles.cf390c6bfbe7555f.css"> Skip to main content

RHEED in-situ monitored step edge diffusion during interrupted laser ablation epitaxy growth of SrTiO3

dc.citation.epage716en_US
dc.citation.issue6en_US
dc.citation.spage710en_US
dc.citation.volume42en_US
dc.citation.woscount0
dc.contributor.authorWang, TCen_US
dc.contributor.authorLee, JYen_US
dc.contributor.authorHsieh, CCen_US
dc.contributor.authorJuang, JYen_US
dc.contributor.authorWu, KHen_US
dc.contributor.authorUen, TMen_US
dc.contributor.authorGou, YSen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.date.accessioned2014-12-08T15:37:14Z
dc.date.available2014-12-08T15:37:14Z
dc.date.issued2004-12-01en_US
dc.description.abstractA series of investigations on the interrupted deposition of laser ablation strontium titanate epitaxy growth were conducted. RHEED intensity recovery curves at various temperatures show a near-quadratic power law dependence on annealing time. Combined with the evidence showing the intimate correlation between the step edge density and the RHEED intensity, a diffusion Arrhenius plot with the activation energy of 1.0 eV was obtained for the kinetics of step edge migration.en_US
dc.identifier.issn0577-9073en_US
dc.identifier.journalCHINESE JOURNAL OF PHYSICSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/25585
dc.identifier.wosnumberWOS:000225781900005
dc.language.isoen_USen_US
dc.titleRHEED in-situ monitored step edge diffusion during interrupted laser ablation epitaxy growth of SrTiO3en_US
dc.typeArticleen_US

Files

Original bundle

Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
000225781900005.pdf
Size:
265.98 KB
Format:
Adobe Portable Document Format

License bundle

Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
license.txt
Size:
1.71 KB
Format:
Item-specific license agreed to upon submission
Description: