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NOVEL GAAS VOLTAGE-CONTROLLABLE NEGATIVE DIFFERENTIAL RESISTANCE TRANSISTOR PREPARED BY MOLECULAR-BEAM EPITAXY

dc.citation.epage1159en_US
dc.citation.issue12en_US
dc.citation.spage1157en_US
dc.citation.volume54en_US
dc.citation.woscount12
dc.contributor.authorYARN, KFen_US
dc.contributor.authorWANG, YHen_US
dc.contributor.authorCHANG, CYen_US
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.date.accessioned2014-12-08T15:05:52Z
dc.date.available2014-12-08T15:05:52Z
dc.date.issued1989-03-20en_US
dc.identifier.doi10.1063/1.100747en_US
dc.identifier.issn0003-6951en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.100747en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/4392
dc.identifier.wosnumberWOS:A1989T690700028
dc.language.isoen_USen_US
dc.titleNOVEL GAAS VOLTAGE-CONTROLLABLE NEGATIVE DIFFERENTIAL RESISTANCE TRANSISTOR PREPARED BY MOLECULAR-BEAM EPITAXYen_US
dc.typeArticleen_US

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