Conformal deposition of Ni-P on anodic aluminum oxide template

Abstract

A nanoporous semiconducting template was fabricated by conformal deposition of Ni-P over anodic aluminum oxide (AAO). Electroless plating was conducted in repeated steps of sensitization, activation, and deposition using NaH2PO2 as a reducing agent. Variables including pH, temperature, time, and additive were studied for conformal deposition within the pore channels without clogging the openings prematurely. We demonstrated concentric Ni-P tubes with an inner diameter of 84 nm at 10 mu m length. Resistivity of the AAO template was determined at 39.6 Omega cm for through-channel direction. Incorporation of the semiconducting AAO structure with established template synthesis technologies opens up the opportunity for numerous devices. (C) 2007 The Electrochemical Society.