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THE ELLIPSOMETRIC MEASUREMENTS ON SIO2 BY INTENSITY RATIO TECHNIQUE

dc.citation.epage180en_US
dc.citation.spage171en_US
dc.citation.volume2265en_US
dc.contributor.authorCHAO, YFen_US
dc.contributor.authorWEI, CSen_US
dc.contributor.authorLEE, WCen_US
dc.contributor.authorLIN, SCen_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.date.accessioned2014-12-08T15:27:52Z
dc.date.available2014-12-08T15:27:52Z
dc.date.issued1994en_US
dc.identifier.doi10.1117/12.186666en_US
dc.identifier.isbn0-8194-1589-8en_US
dc.identifier.journalPOLARIZATION ANALYSIS AND MEASUREMENT IIen_US
dc.identifier.urihttp://dx.doi.org/10.1117/12.186666en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/20125
dc.identifier.wosnumberWOS:A1994BB96Z00019
dc.language.isoen_USen_US
dc.subjectELLIPSOMETRYen_US
dc.subjectTHIN FILMen_US
dc.titleTHE ELLIPSOMETRIC MEASUREMENTS ON SIO2 BY INTENSITY RATIO TECHNIQUEen_US
dc.typeProceedings Paperen_US

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