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RUTHERFORD BACKSCATTERING SPECTROSCOPY ANALYSIS OF AR+ IMPLANTED YTTRIA STABILIZED ZIRCONIA

dc.citation.epage918en_US
dc.citation.issue8en_US
dc.citation.spage916en_US
dc.citation.volume9en_US
dc.citation.woscount1
dc.contributor.authorDUH, JGen_US
dc.contributor.authorWU, YSen_US
dc.contributor.authorCHOUI, BSen_US
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.date.accessioned2014-12-08T15:05:31Z
dc.date.available2014-12-08T15:05:31Z
dc.date.issued1990-08-01en_US
dc.identifier.issn0261-8028en_US
dc.identifier.journalJOURNAL OF MATERIALS SCIENCE LETTERSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/4043
dc.identifier.wosnumberWOS:A1990DT98400016
dc.language.isoen_USen_US
dc.titleRUTHERFORD BACKSCATTERING SPECTROSCOPY ANALYSIS OF AR+ IMPLANTED YTTRIA STABILIZED ZIRCONIAen_US
dc.typeArticleen_US

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