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嵌附式減光型相移圖罩之模擬與製備

dc.contributor.author龍文安en_US
dc.contributor.authorLoong Wen-anen_US
dc.contributor.department交通大學應用化學系zh_TW
dc.date.accessioned2014-12-13T10:36:53Z
dc.date.available2014-12-13T10:36:53Z
dc.date.issued1999en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC88-2215-E009-025zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=418240&docId=74198en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/94241
dc.language.isozh_TWen_US
dc.subject相移光罩zh_TW
dc.subject活性離子蝕刻zh_TW
dc.subject電子束zh_TW
dc.subject微影術zh_TW
dc.subject步進機zh_TW
dc.subjectPhase shift mask (PSM)en_US
dc.subjectReactive ion etching (RIE)en_US
dc.subjectE-beamen_US
dc.subjectLithographyen_US
dc.subjectStepperen_US
dc.title嵌附式減光型相移圖罩之模擬與製備zh_TW
dc.titleSimulation and Fabrication of Embedded Attenuated Phase-Shifting Masken_US
dc.typePlanen_US

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