嵌附式減光型相移圖罩之模擬與製備
| dc.contributor.author | 龍文安 | en_US |
| dc.contributor.author | Loong Wen-an | en_US |
| dc.contributor.department | 交通大學應用化學系 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:36:53Z | |
| dc.date.available | 2014-12-13T10:36:53Z | |
| dc.date.issued | 1999 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC88-2215-E009-025 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=418240&docId=74198 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/94241 | |
| dc.language.iso | zh_TW | en_US |
| dc.subject | 相移光罩 | zh_TW |
| dc.subject | 活性離子蝕刻 | zh_TW |
| dc.subject | 電子束 | zh_TW |
| dc.subject | 微影術 | zh_TW |
| dc.subject | 步進機 | zh_TW |
| dc.subject | Phase shift mask (PSM) | en_US |
| dc.subject | Reactive ion etching (RIE) | en_US |
| dc.subject | E-beam | en_US |
| dc.subject | Lithography | en_US |
| dc.subject | Stepper | en_US |
| dc.title | 嵌附式減光型相移圖罩之模擬與製備 | zh_TW |
| dc.title | Simulation and Fabrication of Embedded Attenuated Phase-Shifting Mask | en_US |
| dc.type | Plan | en_US |
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