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Optical phonon emission in GaAs/AlAs and GaAs/Al0.7Ga0.3As multiple quantum well structures

dc.citation.epage150en_US
dc.citation.issue1-2en_US
dc.citation.spage145en_US
dc.citation.volume92en_US
dc.citation.woscount0
dc.contributor.authorSun, KWen_US
dc.contributor.authorWang, CMen_US
dc.contributor.authorChang, HYen_US
dc.contributor.authorWang, SYen_US
dc.contributor.authorLee, CPen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:44:32Z
dc.date.available2014-12-08T15:44:32Z
dc.date.issued2000-12-01en_US
dc.description.abstractWe have performed Raman scattering measurements and hot electron-neutral acceptor (hot(e, Angstrom)) luminescence experiments on Be-doped GaAs/AlAs and GaAs/Al0.7Ga0.3As multiple quantum well structures, with fixed well width of 50 Angstrom and barrier thickness of 5, 25, 50,120 Angstrom, to determine the optical phonon energy emitted by the hot electrons excited in the quantum wells. It was shown that the relaxation of electrons in the GaAs layer is dominated by the AlAs-like optical phonon emission for samples with larger barriers, but by GaAs optical phonons for smaller barriers. (C) 2001 Elsevier Science B.V. All rights reserved.en_US
dc.identifier.doi10.1016/S0022-2313(00)00231-3en_US
dc.identifier.issn0022-2313en_US
dc.identifier.journalJOURNAL OF LUMINESCENCEen_US
dc.identifier.urihttp://dx.doi.org/10.1016/S0022-2313(00)00231-3en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/30058
dc.identifier.wosnumberWOS:000166236200017
dc.language.isoen_USen_US
dc.subjectphotoluminescenceen_US
dc.subjectRaman scatteringen_US
dc.subjectoptical phononen_US
dc.titleOptical phonon emission in GaAs/AlAs and GaAs/Al0.7Ga0.3As multiple quantum well structuresen_US
dc.typeArticleen_US

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