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Investigating the improvement of resistive switching trends after post-forming negative bias stress treatment

dc.citation.epageen_US
dc.citation.issue13en_US
dc.citation.volume99en_US
dc.citation.woscount16
dc.contributor.authorTseng, Hsueh-Chihen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorHuang, Jheng-Jieen_US
dc.contributor.authorYang, Po-Chunen_US
dc.contributor.authorChen, Yu-Tingen_US
dc.contributor.authorJian, Fu-Yenen_US
dc.contributor.authorSze, S. M.en_US
dc.contributor.authorTsai, Ming-Jinnen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:20:48Z
dc.date.available2014-12-08T15:20:48Z
dc.date.issued2011-09-26en_US
dc.description.abstractThis paper investigates the improvement of resistive switching trends after post-forming negative bias stress treatment of a Pt/Yb(2)O(3)/TiN device that has undergone positive bias forming process for activation. After the treatment, characteristics of the conductive filament, such as the temperature dependence of resistivity and transition mechanism, undergo changes. Furthermore, this treatment causes the conductive filament to transform from being primarily composed of vacancies to being metallic Yb dominant, which not only reduces operation voltages such as V(set) and V(reset) but also improves the on/off ratio. In reliability tests, the device has stable retention. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3645004]en_US
dc.identifier.doi10.1063/1.3645004en_US
dc.identifier.issn0003-6951en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3645004en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/14789
dc.identifier.wosnumberWOS:000295618000039
dc.language.isoen_USen_US
dc.subjectelectrical conductivity transitionsen_US
dc.subjectelectroformingen_US
dc.subjectplatinumen_US
dc.subjectrandom-access storageen_US
dc.subjectreliabilityen_US
dc.subjecttitanium compoundsen_US
dc.subjectytterbium compoundsen_US
dc.titleInvestigating the improvement of resistive switching trends after post-forming negative bias stress treatmenten_US
dc.typeArticleen_US

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