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電極/鐵電薄膜/結緣層/矽晶體結構之薄膜製程及特性劣化研究

dc.contributor.author陳三元en_US
dc.contributor.authorCHEN SAN-YUANen_US
dc.contributor.department國立交通大學材料科學與工程學系zh_TW
dc.date.accessioned2014-12-13T10:39:51Z
dc.date.available2014-12-13T10:39:51Z
dc.date.issued2001en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC90-2215-E009-061zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=665675&docId=126367en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/96874
dc.language.isozh_TWen_US
dc.subject電極zh_TW
dc.subject鐵電薄膜zh_TW
dc.subject絕緣層zh_TW
dc.subject矽晶體zh_TW
dc.subject特性劣化zh_TW
dc.subjectElectrodeen_US
dc.subjectFerroelectric thin filmen_US
dc.subjectInsulating layeren_US
dc.subjectSilicon crystalen_US
dc.subjectCharacterization degradationen_US
dc.title電極/鐵電薄膜/結緣層/矽晶體結構之薄膜製程及特性劣化研究zh_TW
dc.titleCharacteristic Degradation and Processing Development of Ferroelectric-Film for Metal-Ferroelectric-Insulator-Semiconductoren_US
dc.typePlanen_US

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