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High-resolution through-focus metric with two-pitch grating target

dc.citation.epage36en_US
dc.citation.issue1en_US
dc.citation.spage31en_US
dc.citation.volume276en_US
dc.citation.woscount1
dc.contributor.authorShyu, Deh-Mingen_US
dc.contributor.authorLu, Mao-Hongen_US
dc.contributor.authorKo, Chun-Hungen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:13:35Z
dc.date.available2014-12-08T15:13:35Z
dc.date.issued2007-08-01en_US
dc.description.abstractThrough-focus focus-metric is a method that is used to analyze images on a fixed plane with the help of focus-metric values when the target moves through the focus. In this study, an optical microscope having a magnification of 250x is constructed. A two-pitch grating target is imaged on a CCD detector and through-focus image data are measured. In addition, the optical field on the CCD detector is simulated using the boundary element method and physical optics propagation. By comparing the measured focus-metric signatures with the simulated signatures, information regarding the linewidth is obtained. The results show that the through-focus focus-metric method is a very sensitive method that can be used for measuring parameters such as the linewidth. Thus, a nanoscale resolution can be achieved. (C) 2007 Elsevier B.V. All rights reserved.en_US
dc.identifier.doi10.1016/j.optcom.2007.04.001en_US
dc.identifier.issn0030-4018en_US
dc.identifier.journalOPTICS COMMUNICATIONSen_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.optcom.2007.04.001en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/10491
dc.identifier.wosnumberWOS:000247749900004
dc.language.isoen_USen_US
dc.titleHigh-resolution through-focus metric with two-pitch grating targeten_US
dc.typeArticleen_US

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