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Fabrication of narrow-band self-filtering GaAs photodetector by epitaxy

dc.citation.epageen_US
dc.citation.issue11en_US
dc.citation.volume76en_US
dc.citation.woscount0
dc.contributor.authorShie, JSen_US
dc.contributor.authorHwang, TSDen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:18:10Z
dc.date.available2014-12-08T15:18:10Z
dc.date.issued2005-11-01en_US
dc.description.abstractA narrow-band self-filtering (NBSF) GaAs photodiode has been fabricated by the LPE technique, where epilayers of high-low-high N doping were grown on a P-type substrate. By proper control of the thickness and doping concentration of each layer, it can be demonstrated that the fabricated NBSF detector has a spectral bandwidth as narrow as 315 angstrom at 880 nm peak wavelength. This means over 98% of the blue-side light is suppressible, indicating that the NBSF photodetector is a useful device for many applications where the suppression of high background light is necessary. (c) 2005 American Institute of Physics.en_US
dc.identifier.doi10.1063/1.2133996en_US
dc.identifier.issn0034-6748en_US
dc.identifier.journalREVIEW OF SCIENTIFIC INSTRUMENTSen_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.2133996en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/13136
dc.identifier.wosnumberWOS:000233569800009
dc.language.isoen_USen_US
dc.titleFabrication of narrow-band self-filtering GaAs photodetector by epitaxyen_US
dc.typeArticleen_US

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