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Mechanism of GeO2 resistive switching based on the multi-phonon assisted tunneling between traps

dc.citation.epageen_US
dc.citation.issue24en_US
dc.citation.volume100en_US
dc.citation.woscount6
dc.contributor.authorShaposhnikov, A. V.en_US
dc.contributor.authorPerevalov, T. V.en_US
dc.contributor.authorGritsenko, V. A.en_US
dc.contributor.authorCheng, C. H.en_US
dc.contributor.authorChin, A.en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:23:35Z
dc.date.available2014-12-08T15:23:35Z
dc.date.issued2012-06-11en_US
dc.description.abstractModel of evenly distributed traps in bulk dielectric is proposed for the resistive memory switching mechanism. Switching from high resistance to the low resistance state is explained by several-fold increase in trap concentration after the application of switching voltage. Both high and low resistance conductivities are governed by multi-phonon ionization and tunneling between neighboring traps. Thermal trap energy for oxygen vacancy and electron effective mass for crystal alpha-GeO2 were calculated using density functional theory and used for the fitting of our charge transport model of resistive memory. The model was verified on the TaN-GeO2-Ni structure with good semi-quantitative agreement with experiment. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4729589]en_US
dc.identifier.doi243506en_US
dc.identifier.issn0003-6951en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.identifier.urihttp://dx.doi.org/243506en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/16484
dc.identifier.wosnumberWOS:000305269200078
dc.language.isoen_USen_US
dc.titleMechanism of GeO2 resistive switching based on the multi-phonon assisted tunneling between trapsen_US
dc.typeArticleen_US

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