Crack-free GaN/AlN distributed Bragg reflectors incorporated with GaN/AlN superlattices grown by metalorganic chemical vapor deposition

Abstract

A crack-free GaN/AlN distributed Bragg reflector (DBR) incorporated with GaN/AlN superlattice (SL) layers was grown on a c-plane sapphire substrate by metalorganic chemical vapor deposition. Three sets of half-wave layers consisting of 5.5 periods of GaN/AlN SL layers and GaN layer were inserted in every five pairs of the 20 pair GaN/AlN DBR structure to suppress the crack generation. The grown GaN/AlN DBRs with SL insertion layers showed no observable cracks in the structure and achieved high peak reflectivity of 97% at 399 nm with a stop band width of 14 nm. Based on the x-ray analysis, the reduction in the in-plane tensile stress in the DBR structure with insertion of SL layers could be responsible for the suppression of crack formation and achievement of high reflectivity. (c) 2006 American Institute of Physics.