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Fabrication and microstructure of the dc-magnetron-sputtered YBa2Cu3O7-x superconducting thin films

dc.citation.epage76en_US
dc.citation.issue2en_US
dc.citation.spage67en_US
dc.citation.volume7en_US
dc.citation.woscount0
dc.contributor.authorKoo, HSen_US
dc.contributor.authorTseng, TYen_US
dc.contributor.authorChang, WRen_US
dc.contributor.authorTu, GCen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:02:43Z
dc.date.available2014-12-08T15:02:43Z
dc.date.issued1996-04-01en_US
dc.description.abstractSystematic investigations were conducted to determine the effect of deposition conditions on the microstructure and superconducting properties of YBa2Cu3O7-x thin films produced by d.c. magnetron sputtering on (001) MgO substrate. The films were c-axis preferentially oriented with respect to the (001) MgO surface at substrate temperatures of 680-700 degrees C. X-ray diffraction patterns clearly indicated the existence of the c-axis alignment normal to the substrate surface and some second phases. The second phases, including a Cu-rich phase and Y2O3, were identified by energy dispersive X-ray spectrometer and the microstructures were analysed by electron and;atomic force microscopes.en_US
dc.identifier.issn0957-4522en_US
dc.identifier.journalJOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/1355
dc.identifier.wosnumberWOS:A1996UB52500002
dc.language.isoen_USen_US
dc.titleFabrication and microstructure of the dc-magnetron-sputtered YBa2Cu3O7-x superconducting thin filmsen_US
dc.typeArticleen_US

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