EFFECTS OF HEAT-TREATMENT AND ION DOPING OF INDIUM OXIDE
| dc.citation.epage | 66 | en_US |
| dc.citation.issue | 1 | en_US |
| dc.citation.spage | 59 | en_US |
| dc.citation.volume | 173 | en_US |
| dc.citation.woscount | 22 | |
| dc.contributor.author | LEE, CH | en_US |
| dc.contributor.author | KUO, CV | en_US |
| dc.contributor.author | LEE, CL | en_US |
| dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
| dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
| dc.date.accessioned | 2014-12-08T15:05:49Z | |
| dc.date.available | 2014-12-08T15:05:49Z | |
| dc.date.issued | 1989-06-01 | en_US |
| dc.identifier.issn | 0040-6090 | en_US |
| dc.identifier.journal | THIN SOLID FILMS | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/4348 | |
| dc.identifier.wosnumber | WOS:A1989AF46400006 | |
| dc.language.iso | en_US | en_US |
| dc.title | EFFECTS OF HEAT-TREATMENT AND ION DOPING OF INDIUM OXIDE | en_US |
| dc.type | Article | en_US |
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