<link rel="stylesheet" href="styles.cf390c6bfbe7555f.css"> Skip to main content

超薄閘極氧化層元件可靠性研究

dc.contributor.author汪大暉en_US
dc.contributor.authorWANG TAHUIen_US
dc.contributor.department國立交通大學電子工程學系zh_TW
dc.date.accessioned2014-12-13T10:39:41Z
dc.date.available2014-12-13T10:39:41Z
dc.date.issued2001en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC90-2215-E009-069zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=665707&docId=126375en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/96741
dc.language.isozh_TWen_US
dc.subject超薄閘極zh_TW
dc.subject可靠度zh_TW
dc.subject氧化層zh_TW
dc.subject協助金屬-氧化物-半導體元件zh_TW
dc.subjectUltra-thin gateen_US
dc.subjectReliabilityen_US
dc.subjectOxide layeren_US
dc.subjectCMOS deviceen_US
dc.title超薄閘極氧化層元件可靠性研究zh_TW
dc.titleUltra-Thin Gate Dielectric CMOS Device Reliabilityen_US
dc.typePlanen_US

Files

Original bundle

Now showing 1 - 2 of 2
Loading...
Thumbnail Image
Name:
902215E009069.pdf
Size:
438.37 KB
Format:
Adobe Portable Document Format
Loading...
Thumbnail Image
Name:
902215E009069.pdf
Size:
438.37 KB
Format:
Adobe Portable Document Format

License bundle

Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
license.txt
Size:
1.71 KB
Format:
Item-specific license agreed to upon submission
Description: