THz radiation emission properties of multienergy arsenic-ion-implanted GaAs and semi-insulating GaAs based photoconductive antennas

dc.citation.epage3001en_US
dc.citation.issue5en_US
dc.citation.spage2996en_US
dc.citation.volume93en_US
dc.citation.woscount41
dc.contributor.authorLiu, TAen_US
dc.contributor.authorTani, Men_US
dc.contributor.authorPan, CLen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:41:13Z
dc.date.available2014-12-08T15:41:13Z
dc.date.issued2003-03-01en_US
dc.description.abstractWe compare the performance of THz photoconductive (PC) emitter antennas fabricated on multienergy arsenic ion implanted GaAs (multi-GaAs:As+) and semi-insulating GaAs. High damage threshold biasing (>60 kV/cm) and large saturation optical-pumping power (similar to20 mW) for multi-GaAs:As+ based PC antennas are reported. Carrier mobility in the As ion implanted layer of GaAs:As+ was estimated to be about 150 cm(2)/V/s, which was comparable to that of. low,temperature GaAs. (C) 2003 American Institute of Physics.en_US
dc.identifier.doi10.1063/1.1541105en_US
dc.identifier.issn0021-8979en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.1541105en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/28037
dc.identifier.wosnumberWOS:000181307000109
dc.language.isoen_USen_US
dc.titleTHz radiation emission properties of multienergy arsenic-ion-implanted GaAs and semi-insulating GaAs based photoconductive antennasen_US
dc.typeArticleen_US

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