On Characteristic Variability of 16-nm-Gate Bulk FinFET Devices Induced by Intrinsic Parameter Fluctuation and Process Variation Effect
| dc.citation.epage | 138 | en_US |
| dc.citation.spage | 137 | en_US |
| dc.citation.woscount | 0 | en_US |
| dc.contributor.author | Chen, Chieh-Yang | en_US |
| dc.contributor.author | Li, Yiming | en_US |
| dc.contributor.author | Chen, Yu-Yu | en_US |
| dc.contributor.author | Chang, Han-Tung | en_US |
| dc.contributor.author | Hsu, Sheng-Chia | en_US |
| dc.contributor.author | Huang, Wen-Tsung | en_US |
| dc.contributor.author | Yang, Chin-Min | en_US |
| dc.contributor.author | Chen, Li-Wen | en_US |
| dc.contributor.department | 資訊工程學系 | zh_TW |
| dc.contributor.department | Department of Computer Science | en_US |
| dc.date.accessioned | 2015-07-21T08:31:31Z | |
| dc.date.available | 2015-07-21T08:31:31Z | |
| dc.date.issued | 2013-01-01 | en_US |
| dc.description.abstract | en_US | |
| dc.identifier.isbn | 978-1-4799-0811-0; 978-1-4799-0812-7 | en_US |
| dc.identifier.issn | 1548-3770 | en_US |
| dc.identifier.journal | 2013 71ST ANNUAL DEVICE RESEARCH CONFERENCE (DRC) | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/124975 | |
| dc.identifier.wosnumber | WOS:000347466000074 | en_US |
| dc.language.iso | en_US | en_US |
| dc.title | On Characteristic Variability of 16-nm-Gate Bulk FinFET Devices Induced by Intrinsic Parameter Fluctuation and Process Variation Effect | en_US |
| dc.type | Proceedings Paper | en_US |
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