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會議論文;;Conferences Paper
On Characteristic Variability of 16-nm-Gate Bulk FinFET Devices Induced by Intrinsic Parameter Fluctuation and Process Variation Effect
On Characteristic Variability of 16-nm-Gate Bulk FinFET Devices Induced by Intrinsic Parameter Fluctuation and Process Variation Effect
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Date
2013-01-01
Authors
Chen, Chieh-Yang
Li, Yiming
Chen, Yu-Yu
Chang, Han-Tung
Hsu, Sheng-Chia
Huang, Wen-Tsung
Yang, Chin-Min
Chen, Li-Wen
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https://ir.lib.nycu.edu.tw/handle/11536/124975
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