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The 3rd Asian Conference on Chemical Vapor Deposition (3rd Asian-CVD), Taipei, Taiwan, November 12-14, 2004 - Preface

dc.citation.epage1en_US
dc.citation.issue1-2en_US
dc.citation.spage1en_US
dc.citation.volume498en_US
dc.citation.woscount0
dc.contributor.authorFeng, ZCen_US
dc.contributor.authorChen, CFen_US
dc.contributor.authorWilliams, Ken_US
dc.contributor.authorShan, Wen_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.date.accessioned2014-12-08T15:17:18Z
dc.date.available2014-12-08T15:17:18Z
dc.date.issued2006-03-01en_US
dc.identifier.doi10.1016/j.tsf.2005.07.052en_US
dc.identifier.issn0040-6090en_US
dc.identifier.journalTHIN SOLID FILMSen_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.tsf.2005.07.052en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/12582
dc.identifier.wosnumberWOS:000235270500001
dc.language.isoen_USen_US
dc.titleThe 3rd Asian Conference on Chemical Vapor Deposition (3rd Asian-CVD), Taipei, Taiwan, November 12-14, 2004 - Prefaceen_US
dc.typeEditorial Materialen_US

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