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PREPARATION OF BARIUM-TITANATE FILMS ON SILICON BY ELECTRON-BEAM EVAPORATION TECHNIQUES

dc.citation.epage755en_US
dc.citation.issue6en_US
dc.citation.spage755en_US
dc.citation.volume6en_US
dc.citation.woscount0
dc.contributor.authorWU, CYen_US
dc.contributor.authorWU, CYen_US
dc.contributor.authorSEN, WZen_US
dc.contributor.department工學院zh_TW
dc.contributor.departmentCollege of Engineeringen_US
dc.date.accessioned2014-12-08T15:07:11Z
dc.date.available2014-12-08T15:07:11Z
dc.date.issued1977en_US
dc.identifier.issn0361-5235en_US
dc.identifier.journalJOURNAL OF ELECTRONIC MATERIALSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/5644
dc.identifier.wosnumberWOS:A1977EA13600096
dc.language.isoen_USen_US
dc.titlePREPARATION OF BARIUM-TITANATE FILMS ON SILICON BY ELECTRON-BEAM EVAPORATION TECHNIQUESen_US
dc.typeMeeting Abstracten_US

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