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Mechanism of power consumption inhibitive multi-layer Zn:SiO2/SiO2 structure resistance random access memory

dc.citation.epageen_US
dc.citation.issue23en_US
dc.citation.volume114en_US
dc.citation.woscount5
dc.contributor.authorZhang, Ruien_US
dc.contributor.authorTsai, Tsung-Mingen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorChang, Kuan-Changen_US
dc.contributor.authorChen, Kai-Huangen_US
dc.contributor.authorLou, Jen-Chungen_US
dc.contributor.authorYoung, Tai-Faen_US
dc.contributor.authorChen, Jung-Huien_US
dc.contributor.authorHuang, Syuan-Yongen_US
dc.contributor.authorChen, Min-Chenen_US
dc.contributor.authorShih, Chih-Chengen_US
dc.contributor.authorChen, Hsin-Luen_US
dc.contributor.authorPan, Jhih-Hongen_US
dc.contributor.authorTung, Cheng-Weien_US
dc.contributor.authorSyu, Yong-Enen_US
dc.contributor.authorSze, Simon M.en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:34:02Z
dc.date.available2014-12-08T15:34:02Z
dc.date.issued2013-12-21en_US
dc.description.abstractIn this paper, multi-layer Zn:SiO2/SiO2 structure is introduced to reduce the operation power consumption of resistive random access memory (RRAM) device by modifying the filament formation process. And the configuration of multi-layer Zn:SiO2/SiO2 structure is confirmed and demonstrated by auger electron spectrum. Material analysis together with conduction current fitting is applied to qualitatively evaluate the carrier conduction mechanism on both low resistance state and high resistance state. Finally, single layer and multilayer conduction models are proposed, respectively, to clarify the corresponding conduction characteristics of two types of RRAM devices. (C) 2013 AIP Publishing LLC.en_US
dc.identifier.doi10.1063/1.4843695en_US
dc.identifier.issn0021-8979en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.4843695en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/23405
dc.identifier.wosnumberWOS:000329056800055
dc.language.isoen_USen_US
dc.titleMechanism of power consumption inhibitive multi-layer Zn:SiO2/SiO2 structure resistance random access memoryen_US
dc.typeArticleen_US

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