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SPECIFIC CONTACT RESISTANCE OF NI-AU-GE-NGAP SYSTEM

dc.citation.epage391en_US
dc.citation.issue2en_US
dc.citation.spage385en_US
dc.citation.volume21en_US
dc.citation.woscount4
dc.contributor.authorLEI, TFen_US
dc.contributor.authorLEE, CLen_US
dc.contributor.authorCHANG, CYen_US
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.date.accessioned2014-12-08T15:06:32Z
dc.date.available2014-12-08T15:06:32Z
dc.date.issued1978en_US
dc.identifier.issn0038-1101en_US
dc.identifier.journalSOLID-STATE ELECTRONICSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/5113
dc.identifier.wosnumberWOS:A1978ES98800008
dc.language.isoen_USen_US
dc.titleSPECIFIC CONTACT RESISTANCE OF NI-AU-GE-NGAP SYSTEMen_US
dc.typeArticleen_US

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