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Influence of barrier growth temperature on the properties of InGaN/GaN quantum Well

dc.citation.epage5303en_US
dc.citation.issue9Aen_US
dc.citation.spage5302en_US
dc.citation.volume40en_US
dc.citation.woscount16
dc.contributor.authorWen, TCen_US
dc.contributor.authorLee, WIen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department友訊交大聯合研發中心zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentD Link NCTU Joint Res Ctren_US
dc.date.accessioned2014-12-08T15:43:27Z
dc.date.available2014-12-08T15:43:27Z
dc.date.issued2001-09-01en_US
dc.description.abstractIn this study we investigate the effect of barrier growth temperature on the properties of InGaN/GaN multiple quantum wells. Double-crystal X-ray diffraction of MQW structures indicates that increasing the barrier growth temperature will reduce the well thickness. However, the photoluminescence peak wavelength shift is greater than the change of in the effective bandgap due to the reduction of well width. In addition to the reduction of well width, the determination of the origin of the significant blue shift in the photoluminescence peak wavelength should also take the strain effect into account.en_US
dc.identifier.doi10.1143/JJAP.40.5302en_US
dc.identifier.issn0021-4922en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.40.5302en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/29413
dc.identifier.wosnumberWOS:000171677200022
dc.language.isoen_USen_US
dc.subjectInGaN/GaN multiple quantum wellen_US
dc.subjectbarrier growth temperatureen_US
dc.subjectstrainen_US
dc.titleInfluence of barrier growth temperature on the properties of InGaN/GaN quantum Wellen_US
dc.typeArticleen_US

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