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高介電氧化層奈米CMOS元件可靠性關鍵問題及界面量測技術研究(I)
高介電氧化層奈米CMOS元件可靠性關鍵問題及界面量測技術研究(I)
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922215E009059.pdf
(290.58 KB)
Date
2003
Authors
莊紹勳
Chung Steve S
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https://www.grb.gov.tw/search/planDetail?id=873536&docId=167355
https://ir.lib.nycu.edu.tw/handle/11536/91858
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