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Dielectric confinement effect in ZnO quantum dots embedded in amorphous SiO2 matrix

dc.citation.epage6075en_US
dc.citation.issue19en_US
dc.citation.spage6071en_US
dc.citation.volume40en_US
dc.citation.woscount11
dc.contributor.authorPeng, Yu-Yunen_US
dc.contributor.authorHsieh, Tsung-Eongen_US
dc.contributor.authorHsu, Chia-Hungen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.date.accessioned2014-12-08T15:13:15Z
dc.date.available2014-12-08T15:13:15Z
dc.date.issued2007-10-07en_US
dc.description.abstractThe dielectric confinement effect on the blue shift Delta E-g(a) of the ZnO quantum dots (QDs) embedded in the SiO2 matrix is evaluated by applying a multi-shell two-electron system model. The experimental measurement and the calculations of various dielectric structures indicate that the composite matrix structure provides a better estimation of the blue shift of the ZnO QDs-SiO2 system than the multi-shell structure. The proportionality factor x defined in this work exhibits a dependence of the dielectric confinement energy on the specific dimension ratio (the b/a ratio) and the dielectric constant epsilon(matrix) of the outer matrix. The result of the calculation also shows the limit of the two-electron system in estimating the ground-state energy of samples with high dot density. However, the correlation shows the existence of the strong dielectric confinement effect in ZnO QDs-SiO2 thin films and allows a better understanding of the semiconductor QDs-dielectric systems.en_US
dc.identifier.doi10.1088/0022-3727/40/19/046en_US
dc.identifier.issn0022-3727en_US
dc.identifier.journalJOURNAL OF PHYSICS D-APPLIED PHYSICSen_US
dc.identifier.urihttp://dx.doi.org/10.1088/0022-3727/40/19/046en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/10243
dc.identifier.wosnumberWOS:000250604000047
dc.language.isoen_USen_US
dc.titleDielectric confinement effect in ZnO quantum dots embedded in amorphous SiO2 matrixen_US
dc.typeArticleen_US

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