12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---總計畫(Ⅱ)

dc.contributor.author	林清發	en_US
dc.contributor.author	LIN TSING-FA	en_US
dc.contributor.department	國立交通大學機械工程研究所	zh_TW
dc.date.accessioned	2014-12-13T10:35:36Z
dc.date.available	2014-12-13T10:35:36Z
dc.date.issued	2001	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.identifier.govdoc	NSC90-2212-E009-075	zh_TW
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=662726&docId=125583	en_US
dc.identifier.uri	https://ir.lib.nycu.edu.tw/handle/11536/93515
dc.language.iso	zh_TW	en_US
dc.subject	矽晶圓	zh_TW
dc.subject	介電薄膜	zh_TW
dc.subject	半導體工業	zh_TW
dc.subject	化學氣相沉積製程設備	zh_TW
dc.subject	Silicon wafer	en_US
dc.subject	Dielectric thin film	en_US
dc.subject	Semiconductor industry	en_US
dc.subject	Chemical vapor deposition process equipment	en_US
dc.title	12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---總計畫(Ⅱ)	zh_TW
dc.title	Research and Development of CVD Process Equipment for a 12-inch Single Silicon Wafer and Growth of BST Dielectric Thin Film (II)	en_US
dc.type	Plan	en_US

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