製作低溫(450℃)鋁閘極複晶矽薄膜電晶體之相關技術發展---低溫薄膜電晶體之相關薄絕緣層之製備研究(I)
| dc.contributor.author | 李崇仁 | en_US |
| dc.contributor.department | 交通大學電子工程系 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:37:18Z | |
| dc.date.available | 2014-12-13T10:37:18Z | |
| dc.date.issued | 1999 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC88-2215-E009-054 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=444146&docId=80428 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/94527 | |
| dc.language.iso | zh_TW | en_US |
| dc.subject | 複晶矽 | zh_TW |
| dc.subject | 薄絕緣層 | zh_TW |
| dc.subject | 化學氣相沈積法 | zh_TW |
| dc.subject | 電漿加強化學氣相沈積法 | zh_TW |
| dc.subject | 快速熱處理 | zh_TW |
| dc.subject | Polysilicon | en_US |
| dc.subject | Thin dielectric | en_US |
| dc.subject | Chemical vapor deposition | en_US |
| dc.subject | Plasma-enhance CVD | en_US |
| dc.subject | Rapid thermal process (RTP) | en_US |
| dc.title | 製作低溫(450℃)鋁閘極複晶矽薄膜電晶體之相關技術發展---低溫薄膜電晶體之相關薄絕緣層之製備研究(I) | zh_TW |
| dc.title | The Study on Thin Dielectrics Preparation Technology for Low Temperature TFTs (I) | en_US |
| dc.type | Plan | en_US |