Improving spin-coating process using altered cover design
| dc.citation.epage | 8029 | en_US |
| dc.citation.issue | 12 | en_US |
| dc.citation.spage | 8028 | en_US |
| dc.citation.volume | 43 | en_US |
| dc.citation.woscount | 1 | |
| dc.contributor.author | Cheng, CM | en_US |
| dc.contributor.author | Chen, RH | en_US |
| dc.contributor.department | 機械工程學系 | zh_TW |
| dc.contributor.department | Department of Mechanical Engineering | en_US |
| dc.date.accessioned | 2014-12-08T15:37:13Z | |
| dc.date.available | 2014-12-08T15:37:13Z | |
| dc.date.issued | 2004-12-01 | en_US |
| dc.description.abstract | A novel work chamber cover design for a spin coater that can reduce the effect of airflow on spin coating is presented. The experimental results reveal that superior uniformity and film area can be obtained by utilizing the modified design instead of the conventional design. | en_US |
| dc.identifier.doi | 10.1143/JJAP.43.8028 | en_US |
| dc.identifier.issn | 0021-4922 | en_US |
| dc.identifier.journal | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1143/JJAP.43.8028 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/25577 | |
| dc.identifier.wosnumber | WOS:000226035000023 | |
| dc.language.iso | en_US | en_US |
| dc.subject | thick-film photoresist | en_US |
| dc.subject | spin coating | en_US |
| dc.subject | work chamber cover | en_US |
| dc.title | Improving spin-coating process using altered cover design | en_US |
| dc.type | Article | en_US |