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A Cu-Metallized InGaP/GaAs Heterojunction Bipolar Transistor with Reliable Pd/Ge/Cu Ohmic Contact for Power Applications

dc.citation.issue2en_US
dc.citation.volume49en_US
dc.citation.woscount0
dc.contributor.authorHuang, Jui-Chienen_US
dc.contributor.authorLin, Yueh-Chinen_US
dc.contributor.authorTseng, Yu-Lingen_US
dc.contributor.authorChen, Ke-Shianen_US
dc.contributor.authorLu, Po-Chinen_US
dc.contributor.authorLin, Mong-Een_US
dc.contributor.authorChang, Edward-Yien_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.date.accessioned2014-12-08T15:07:59Z
dc.date.available2014-12-08T15:07:59Z
dc.date.issued2010en_US
dc.description.abstractA Cu-metallized InGaP/GaAs heterojunction bipolar transistor (HBT) using a Pd/Ge/Cu n-type ohmic contact, a Pt/Ti/Pt/Cu p-type ohmic contact, and a Ti/Pt/Cu interconnect has been fabricated for power applications. The 4 x 20 mu m(2) HBT had an output power of 11.25 dBm with a power-added efficiency of 35.1%. After applying current-accelerated stress for 24 h, the current gain remained larger than 125. The device was also annealed at 200 degrees C for 24 h, and showed a slight decrease in output power from 10.06 to 9.83 dBm. The results demonstrated that reliable Cu metallization can be used for fabricating InGaP/GaAs HBTs for power applications. (C) 2010 The Japan Society of Applied Physicsen_US
dc.identifier.doi10.1143/JJAP.49.020215en_US
dc.identifier.issn0021-4922en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICSen_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.49.020215en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/6277
dc.identifier.wosnumberWOS:000275665700015
dc.language.isoen_USen_US
dc.titleA Cu-Metallized InGaP/GaAs Heterojunction Bipolar Transistor with Reliable Pd/Ge/Cu Ohmic Contact for Power Applicationsen_US
dc.typeArticleen_US

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